A new photobase generator containing oxime-urethane group and its application

被引：9

作者：

Chae, KH ^{[1
]}

Jang, DJ

机构：

[1] Chonnam Natl Univ, Dept Polymer Engn, Kwangju 500757, South Korea

[2] Seoul Natl Univ, Dept Chem, Seoul 151742, South Korea

[3] Seoul Natl Univ, Res Inst Mol Sci, Seoul 151742, South Korea

来源：

MACROMOLECULAR SYMPOSIA | 1999年 / 142卷

关键词：

D O I：

10.1002/masy.19991420117

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Photochemical base formation from oxime-urethane derivatives was observed via pH changes, GC and HPLC analysis, and laser flash photolysis study. Photolysis of these derivatives results in the formation of amines which induce cross-linking of poly(glycidyl methacrylate) (PGMA) upon heating. Photocross-linking reaction of the copolymers, containing epoxy and oxime-urethane groups, were studied by measuring the insoluble fraction of copolymer films under various reaction conditions. Thermal cross-linking reaction of the copolymer was catalysed by the photogenerated pendant amines. The copolymer containing oxime-urethane groups which photogenerate aromatic amines can be utilized as an image recording material.

引用

页码：173 / 183

页数：11

共 18 条

[1]

ANAGNOSTOU T, 1981, J COATING TECHNOL, V53, P35

[2] BASE CATALYSIS IN IMAGING MATERIALS .1. DESIGN AND SYNTHESIS OF NOVEL LIGHT-SENSITIVE URETHANES AS PHOTOPRECURSORS OF AMINES [J].