Surface smoothing mechanism of gas cluster ion beams

被引:49
作者
Toyoda, N [1 ]
Hagiwara, N [1 ]
Matsuo, J [1 ]
Yamada, I [1 ]
机构
[1] Kyoto Univ, Ion Beam Engn Expt Lab, Kyoto 6068501, Japan
关键词
cluster; surface smoothing; Monte Carlo simulation;
D O I
10.1016/S0168-583X(99)00771-5
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Sputtering phenomena by gas cluster ions were modeled based on experimental results, and the surface smoothing effects with cluster ion beam were studied with Monte Carlo simulations. When a cluster ion impacts a slope, ejected atoms move down the slope, and consequently, the valley is filled by these dislocated atoms. An initially rough surface is made smooth by these effects. The dislocated atoms filling the valley are eventually removed with increasing dose, and finally, a very smooth surface with a thin, damaged layer can be obtained. Due to the small distance of the atomic motion induced by a cluster-ion impact, surfaces with narrow hill-and-valley are smoothed initially, and those with longer-scale roughness require more ion-dose to be smoothed. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:980 / 985
页数:6
相关论文
共 18 条
[1]  
AKIZUKI M, 1995, NUCL INSTRUM METH B, V99, P225
[2]   Molecular dynamics simulation of damage formation by cluster ion impact [J].
Aoki, T ;
Matsuo, J ;
Insepov, Z ;
Yamada, I .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1997, 121 (1-4) :49-52
[3]   Smoothing of YBa2Cu3O7-δ films by ion cluster beam bombardment [J].
Chu, WK ;
Li, YP ;
Liu, JR ;
Wu, JZ ;
Tidrow, SC ;
Toyoda, N ;
Matsuo, J ;
Yamada, I .
APPLIED PHYSICS LETTERS, 1998, 72 (02) :246-248
[4]   DYNAMICS OF CLUSTER-SURFACE COLLISIONS [J].
CLEVELAND, CL ;
LANDMAN, U .
SCIENCE, 1992, 257 (5068) :355-361
[5]   A high performance 50nm PMOSFET using decaborane (B10H14) ion implantation and 2-step activation annealing process [J].
Goto, K ;
Matsuo, J ;
Tada, Y ;
Tanaka, T ;
Momiyama, Y ;
Sugii, T ;
Yamada, I .
INTERNATIONAL ELECTRON DEVICES MEETING - 1997, TECHNICAL DIGEST, 1997, :471-474
[6]   Incident angle dependence of the sputtering effect of Ar-cluster-ion bombardment [J].
Kitani, H ;
Toyoda, N ;
Matsuo, J ;
Yamada, I .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1997, 121 (1-4) :489-492
[7]   Sputtering of elemental metals by Ar cluster ions [J].
Matsuo, J ;
Toyoda, N ;
Akizuki, M ;
Yamada, I .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1997, 121 (1-4) :459-463
[8]  
MATSUO J, 1996, NUCL INSTRUM METH B, V79, P223
[9]  
NISHIYAMA A, 1999, P 15 INT C APPL ACC, V421
[10]   Indium oxide film formation by O2 cluster ion-assisted deposition [J].
Qin, W ;
Howson, RP ;
Akizuki, M ;
Matsuo, J ;
Takaoka, G ;
Yamada, I .
MATERIALS CHEMISTRY AND PHYSICS, 1998, 54 (1-3) :258-261