Microtribological properties of ultrathin C60 films grown by molecular beam epitaxy

被引：23

作者：

Nakagawa, H ^{[1
]}

Kibi, S ^{[1
]}

Tagawa, M ^{[1
]}

Umeno, M ^{[1
]}

Ohmae, N ^{[1
]}

机构：

[1] Osaka Univ, Fac Engn, Suita, Osaka 565, Japan

来源：

WEAR | 2000年 / 238卷 / 01期

关键词：

C-60; molecular beam epitaxy; microtribology;

D O I：

10.1016/S0043-1648(99)00339-7

中图分类号：

TH [机械、仪表工业];

学科分类号：

0802 ;

摘要：

Molecular beam epitaxy (MBE) has been applied to a condensation of thin C-60 films with high crystallinity. In situ measurements with reflection high energy electron diffraction (RHEED) showed an epitaxial growth of C-60 film with a lattice constant of 1.0 nm on a MoS2 substrate. Atomic force microscopy (An) and friction force microscopy (FFM) revealed a low friction coefficient of 0.012, the lowest value reported to date for C-60. (C) 2000 Elsevier Science S.A. All rights reserved.

引用

页码：45 / 47

页数：3

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