Physical properties of the HCT EUV source

被引:10
作者
Pankert, J [1 ]
Bergmann, K [1 ]
Klein, J [1 ]
Neff, W [1 ]
Rosier, O [1 ]
Seiwert, S [1 ]
Smith, C [1 ]
Apetz, R [1 ]
Jonkers, J [1 ]
Loeken, M [1 ]
Derra, G [1 ]
机构
[1] Fraunhofer Inst Lasertech, D-52074 Aachen, Germany
来源
EMERGING LITHOGRAPHIC TECHNOLOGIES VI, PTS 1 AND 2 | 2002年 / 4688卷
关键词
EUV source; gas discharge plasma; EUV lithography;
D O I
10.1117/12.472271
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The paper describes the physical properties and recent technical advances of the hollow cathode triggered pinch device (HCT) for the generation of EUV radiation. In previous publications we have demonstrated continuous operation of the untriggered device at 1 kHz in pure Xe. The newer generations operate with a triggering facility which allows a wider parameter space under which stable operation is possible. Repetition frequencies of up to 4 kHz could be demonstrated. Many of the experiments are performed in repetitive bursts of variable lengths and spacing. This allows also to demonstrate that there is only little transient behavior upon switching on and off the source. Conversion efficiencies into the 2% frequency band around 13.5 nm are about 0.4% in 2pi, comparable to the values reported from other groups. Another important parameter is the size of the light emitting region. Here we have studied the influence of electrode geometry and flow properties on the size, to find a best match to the requirements of the collection optics. A major problem for the design of a complete wafer illumination system is the out-of-band portion of the radiation. Especially the DUV fraction of the source spectrum is a concern because it is also reflected to some extend by the Mo-Si multilayer mirrors. We show that the source has a low overall non-EUV part of the emission. In particular, it is demonstrated that there is very little DUV coming out of the usable source volume, well below the specified level.
引用
收藏
页码:87 / 93
页数:3
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