A flow model of porous anodic film growth on aluminium

被引:364
作者
Garcia-Vergara, S. J.
Skeldon, P.
Thompson, G. E.
Habazaki, H.
机构
[1] Univ Manchester, Ctr Corros & Protect, Sch Mat, Manchester M60 1QD, Lancs, England
[2] Hokkaido Univ, Grad Sch Engn, Kita Ku, Sapporo, Hokkaido 0608628, Japan
基金
英国工程与自然科学研究理事会;
关键词
aluminium; anodizing; anodic oxide; porous film; OXIDE-FILMS; ACID ELECTROLYTES; OXYGEN BUBBLES; OXIDATION; MICROANALYSIS; MECHANISM; BEHAVIOR; TUNGSTEN; DENSITY; ALLOYS;
D O I
10.1016/j.electacta.2006.05.054
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The development of pores in a classical porous anodic film formed on aluminium in phosphoric acid solution is investigated. The study employs a tungsten tracer layer that is incorporated into the anodic film from the aluminium substrate, followed by detection of the tracer by transmission electron microscopy and Rutherford backscattering spectroscopy. Distortions of the tungsten layer on entry into the film and retention of tungsten species in the film are compatible with porosity arising mainly from flow of anodic oxide beneath the pore bases towards the cell walls. The behaviour is contrary to expectations of a dissolution model of pore formation. (c) 2006 Elsevier Ltd. All rights reserved.
引用
收藏
页码:681 / 687
页数:7
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