An atmospheric pressure plasma source

被引：210

作者：

Park, J

Henins, I

Herrmann, HW

Selwyn, GS

Jeong, JY

Hicks, RF

Shim, D

Chang, CS

机构：

[1] Univ Calif Los Alamos Natl Lab, Los Alamos, NM 87545 USA

[2] Univ Calif Los Angeles, Dept Chem Engn, Los Angeles, CA 90095 USA

[3] NYU, New York, NY 10012 USA

[4] Korea Adv Inst Sci & Technol, Taejon 305701, South Korea

来源：

APPLIED PHYSICS LETTERS | 2000年 / 76卷 / 03期

关键词：

D O I：

10.1063/1.125724

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

An atmospheric pressure plasma source operated by radio frequency power has been developed. This source produces a unique discharge that is volumetric and homogeneous at atmospheric pressure with a gas temperature below 300 degrees C. It also produces a large quantity of oxygen atoms, similar to 5 x 10(15) cm(-3), which has important value for materials applications. A theoretical model shows electron densities of 0.2-2 x 10(11) cm(-3) and characteristic electron energies of 2-4 eV for helium discharges at a power level of 3-30 W cm(-3). (C) 2000 American Institute of Physics. [S0003-6951(00)01303-6].

引用

页码：288 / 290

页数：3

共 18 条

[1] Deposition of silicon dioxide films with an atmospheric-pressure plasma jet [J].