Breakdown of the high-voltage sheath in metal plasma immersion ion implantation

被引：27

作者：

Anders, A ^{[1
]}

机构：

[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA

来源：

APPLIED PHYSICS LETTERS | 2000年 / 76卷 / 01期

关键词：

D O I：

10.1063/1.125645

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

It is suggested that breakdown of a space-charge sheath obeys similar breakdown laws as known for vacuum breakdown. When metal plasmas of vacuum arcs are used, the sheath between a biased substrate and plasma is very thin and the electric-field strength is very high. Field enhancement (e.g., at sharp edges of the substrate) leads to thermal instability of electron emission centers, followed by dense plasma formation which, in turn, electrically short circuits the sheath (breakdown). Theoretical and experimental evidence for this mechanism is presented. (C) 2000 American Institute of Physics. [S0003-6951(00)02301-9].

引用

页码：28 / 30

页数：3

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