Formation of a new crystalline silicate structure by grafting dialkoxysilyl groups on layered octosilicate

被引:55
作者
Mochizuki, D
Shimojima, A
Kuroda, K [1 ]
机构
[1] Waseda Univ, Dept Appl Chem, Shinjuku Ku, Tokyo 1698555, Japan
[2] Waseda Univ, Mat Sci & Technol Lab, Shinjuku Ku, Tokyo 1690051, Japan
关键词
D O I
10.1021/ja027512t
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Dialkoxydichlorosilanes ((RO)2SiCl2, R = alkyl) react almost completely with interlayer silanol groups in a layered silicate octosilicate to create a new crystalline silicate structure consisting of new five-membered rings arranged regularly on both sides of the silicate layers. The introduction of dialkoxysilyl groups to the interlamellar region of layered silicates with regular reaction sites provides a new methodology for the design and construction of novel crystalline silicate frameworks by a soft chemical route. Copyright © 2002 American Chemical Society.
引用
收藏
页码:12082 / 12083
页数:2
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