Physico-chemical characterization of the effect of excimer laser irradiation on PMMA thin films

被引:18
作者
Beauvois, S [1 ]
Renaut, D [1 ]
Lazzaroni, R [1 ]
Laude, LD [1 ]
Bredas, JL [1 ]
机构
[1] UNIV MONS, CTR RECH ELECT & PHOTON MOL, SERV CHIM MAT NOUVEAUX, B-7000 MONS, BELGIUM
关键词
D O I
10.1016/S0169-4332(96)00748-9
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We study the cross-linking process taking place in poly(methylmethacrylate) upon irradiation at 248 nm with an excimer laser. The physical and chemical properties of the irradiated polymer are traced with FTIR spectroscopy, UV-visible spectrophotometry, and differential scanning calorimetry. In particular, the evolution of the glass transition temperature is examined as a function of the total energy deposited on the polymer surface. It appears that there occurs a competition between a cross-linking reaction and a photodegradation reaction.
引用
收藏
页码:218 / 221
页数:4
相关论文
共 11 条
[1]  
[Anonymous], 1980, EXPT METHODS POLYM C
[2]   LASER-CHEMICAL VAPOR-DEPOSITION FOR MICROELECTRONICS [J].
AUVERT, G .
APPLIED SURFACE SCIENCE, 1995, 86 (1-4) :466-474
[3]   POLYMERS FOR INFORMATION-STORAGE SYSTEMS .3. CROSSLINKED STRUCTURE OF POLYDIMETHACRYLATES [J].
BOWMAN, CN ;
CARVER, AL ;
KENNETT, SN ;
WILLIAMS, MM ;
PEPPAS, NA .
POLYMER, 1990, 31 (01) :135-139
[4]  
EHRLICH DJ, 1983, J VAC SCI TECHNOL B, V1, P969, DOI 10.1116/1.582718
[5]  
GREEN GE, 1982, REV MACRO CHEM C, V21, P187
[6]   LASER CHEMICAL VAPOR-DEPOSITION OF COPPER [J].
HOULE, FA ;
JONES, CR ;
BAUM, T ;
PICO, C ;
KOVAC, CA .
APPLIED PHYSICS LETTERS, 1985, 46 (02) :204-206
[7]  
KALOGEROS AE, 1993, MRS BULL, V6, P22
[8]   WAVELENGTH SENSITIVITY OF THE PHOTODEGRADATION OF POLY(METHYL METHACRYLATE) [J].
MITSUOKA, T ;
TORIKAI, A ;
FUEKI, K .
JOURNAL OF APPLIED POLYMER SCIENCE, 1993, 47 (06) :1027-1032
[9]  
Pappas S.P., 1978, UV curing: science and technology
[10]   GLASS-TRANSITION TEMPERATURE OF IDEAL POLYMERIC NETWORKS [J].
RIETSCH, F ;
DAVELOOSE, D ;
FROELICH, D .
POLYMER, 1976, 17 (10) :859-863