LASER CHEMICAL VAPOR-DEPOSITION OF COPPER

[1] LASER CHEMICAL VAPOR-DEPOSITION - A TECHNIQUE FOR SELECTIVE AREA DEPOSITION [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (11) : 6501 - 6505

[2] LASER CHEMICAL VAPOR-DEPOSITION OF METALS AND INSULATORS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 431 - 431

[3] A STUDY OF BIS(HEXAFLUOROACETYLACETONATO)COPPER(2) [J]. INORGANIC CHEMISTRY, 1966, 5 (03) : 489 - &

[4] ANALYSIS OF THIN-FILMS ARISING FROM ELECTRON-BEAM-INDUCED, ION-BEAM-INDUCED AND PHOTON-BEAM-INDUCED DECOMPOSITION OF CR(CO)6 AND AL(CH3)3 [J]. THIN SOLID FILMS, 1982, 94 (03) : 233 - 247

[5] SENSITIZED PHOTOLYSIS OF BIS-(ACETYLACETONATO)COPPER(II) - GENERAL REACTION PATTERN [J]. CANADIAN JOURNAL OF CHEMISTRY-REVUE CANADIENNE DE CHIMIE, 1979, 57 (01): : 8 - 16

[6] CHEMICAL VAPOR-DEPOSITION OF SILICON USING A CO2-LASER [J]. APPLIED PHYSICS LETTERS, 1978, 32 (04) : 254 - 256

[7] Cotton F.A., 1972, ADV INORGANIC CHEM

[8] OHMIC CONTACT FORMATION ON INP BY PULSED LASER PHOTOCHEMICAL DOPING [J]. APPLIED PHYSICS LETTERS, 1980, 36 (10) : 847 - 849

[9] LASER PHOTODEPOSITION OF METAL-FILMS WITH MICROSCOPIC FEATURES [J]. APPLIED PHYSICS LETTERS, 1979, 35 (02) : 175 - 177

[10] EHRLICH DJ, 1982, THIN SOLID FILMS, V90, P287, DOI 10.1016/0040-6090(82)90377-7

[1] LASER CHEMICAL VAPOR-DEPOSITION - A TECHNIQUE FOR SELECTIVE AREA DEPOSITION [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (11) : 6501 - 6505

[2] LASER CHEMICAL VAPOR-DEPOSITION OF METALS AND INSULATORS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 431 - 431

[3] A STUDY OF BIS(HEXAFLUOROACETYLACETONATO)COPPER(2) [J]. INORGANIC CHEMISTRY, 1966, 5 (03) : 489 - &

[4] ANALYSIS OF THIN-FILMS ARISING FROM ELECTRON-BEAM-INDUCED, ION-BEAM-INDUCED AND PHOTON-BEAM-INDUCED DECOMPOSITION OF CR(CO)6 AND AL(CH3)3 [J]. THIN SOLID FILMS, 1982, 94 (03) : 233 - 247

[5] SENSITIZED PHOTOLYSIS OF BIS-(ACETYLACETONATO)COPPER(II) - GENERAL REACTION PATTERN [J]. CANADIAN JOURNAL OF CHEMISTRY-REVUE CANADIENNE DE CHIMIE, 1979, 57 (01): : 8 - 16

[6] CHEMICAL VAPOR-DEPOSITION OF SILICON USING A CO2-LASER [J]. APPLIED PHYSICS LETTERS, 1978, 32 (04) : 254 - 256

[7] Cotton F.A., 1972, ADV INORGANIC CHEM

[8] OHMIC CONTACT FORMATION ON INP BY PULSED LASER PHOTOCHEMICAL DOPING [J]. APPLIED PHYSICS LETTERS, 1980, 36 (10) : 847 - 849

[9] LASER PHOTODEPOSITION OF METAL-FILMS WITH MICROSCOPIC FEATURES [J]. APPLIED PHYSICS LETTERS, 1979, 35 (02) : 175 - 177

[10] EHRLICH DJ, 1982, THIN SOLID FILMS, V90, P287, DOI 10.1016/0040-6090(82)90377-7