Metallic inductive and capacitive grids: theory and experiment

被引：35

作者：

Minhas, BK ^{[1
]}

Fan, W ^{[1
]}

Agi, K ^{[1
]}

Brueck, SRJ ^{[1
]}

Malloy, KJ ^{[1
]}

机构：

[1] Ctr High Technol Mat, Albuquerque, NM 87106 USA

来源：

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION | 2002年 / 19卷 / 07期

关键词：

D O I：

10.1364/JOSAA.19.001352

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We present theoretical modeling and experimental validation of both capacitive (dot) and inductive (hole) metallic crossed gratings in the mid-infrared (2-5 mum). The gratings are fabricated by use of interferometric lithography and modeled by use of rigorous coupled-wave analysis. Our experimental and numerical investigations of the transmittance spectra of these gratings suggest that, as in inductive grids, the behavior of capacitive grids is described by the coupling of the incident light into surface plasma waves. (C) 2002 Optical Society of America.

引用

页码：1352 / 1359

页数：8

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