Electrodeposition of EuSe thin films onto different substrates

被引:11
作者
Gaikwad, NS [1 ]
Bhosale, CH [1 ]
机构
[1] Shivaji Univ, Dept Phys, Thin Film Phys Lab, Kolhapur 416004, Maharashtra, India
关键词
electrodeposition; europium selenide; characterization; thin films; substrates;
D O I
10.1016/S0254-0584(01)00520-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Electrodeposition and characterization of EuSe thin films onto different substrates such as stainless steel (SS), Ti, Cu, fluorine-doped tin oxide (F-SnO2) covered glasses is described. The films have been prepared in potentiostatic mode using aqueous acidic electrolyte containing Eu and Se precursors at 70degreesC bath temperature and pH 4. The disodium salt of ethylenediaminetetraacetic acid (Na-2-EDTA) is used as a complexant. The results of polarization studies reveal that the deposition potential for EuSe thin films is different for different substrates. The films have been characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), energy disperse analysis by X-rays (EDAX) and optical absorption techniques. The electrodeposited EuSe films are polycrystalline. The SEM investigation revealed that the deposit surface is rough when deposited on copper, titanium and SS, however, it is relatively smooth and fine-grained on F-SnO2 glass substrate. The surface patterns are spherical for titanium and F-SnO2 substrates, while for SS and copper, they are cauliflower- and leaf-like, respectively. The optical absorption studies revealed that the transition is direct and band gap energy E-g is 1.75 eV. (C) 2002 Published by Elsevier Science B.V.
引用
收藏
页码:198 / 203
页数:6
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