Plasmonic nanolithography

被引：498

作者：

Srituravanich, W ^{[1
]}

Fang, N ^{[1
]}

Sun, C ^{[1
]}

Luo, Q ^{[1
]}

Zhang, X ^{[1
]}

机构：

[1] Univ Calif Los Angeles, Dept Mech & Aerosp Engn, Los Angeles, CA 90095 USA

来源：

NANO LETTERS | 2004年 / 4卷 / 06期

关键词：

D O I：

10.1021/nl049573q

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

In this paper, we demonstrate high-density nanolithography by utilizing surface plasmons (SPs). SPs are excited on an aluminum substrate perforated with 2-D hole arrays using a near UV light source in order to resolve sub-wavelength features with high transmission. Our lithography experiments using a 365 nm wavelength light source demonstrate 90 nm dot array patterns on a 170 nm period, well beyond the diffraction limit of far-field optical lithography. In far-field transmission measurements, strong UV light transmission and the wavelength-dependent transmission are observed, which confirms the contribution of SPs. Furthermore, an exposure with larger spacing between the mask and photoresist has been explored for potential noncontact lithography.

引用

页码：1085 / 1088

页数：4

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