Synthesis of si nanostrutures via self-organized pillar mask

被引：14

作者：

Jeong, SH

Cha, YK

Yoo, IK

Song, YS

Chung, CW

机构：

[1] Samsung Adv Inst Technol, U Team, Suwon 440600, South Korea

[2] Inha Univ, Dept Chem Engn, Inchon 402751, South Korea

来源：

CHEMISTRY OF MATERIALS | 2004年 / 16卷 / 09期

关键词：

D O I：

10.1021/cm0497677

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

This communication describes the application of in situ-formed nanoporous alumina pores for obtaining tantalum oxide nanomask arrays, subsequently used to obtain an array of Si nanodot arrays by reactive ion etching.

引用

页码：1612 / 1614

页数：3

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