p-Type oxides for use in transparent diodes

被引:193
作者
Tate, J
Jayaraj, MK
Draeseke, AD
Ulbrich, T
Sleight, AW
Vanaja, KA
Nagarajan, R
Wager, JF
Hoffman, RL
机构
[1] Oregon State Univ, Dept Phys, Corvallis, OR 97331 USA
[2] Oregon State Univ, Dept Chem, Corvallis, OR 97331 USA
[3] Oregon State Univ, Dept Elect & Comp Engn, Corvallis, OR 97331 USA
关键词
transparent conductors; thin films; p-type; delafossite; seebeck effect; oxygen intercalation; transparent diode; CuCrO2; CuScO2; CuGa1-xFexO2; AgCoO2; CuNi2/3Sb1/3O2;
D O I
10.1016/S0040-6090(02)00199-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Several p-type oxides of the delafossite structure have been investigated in the hope that the conductivity and transparency will be high enough to render them useful in the manufacture of transparent p-n junction diodes and other transparent devices. The highest conductivity achieved to date has been 220 S/cm in CuCr1-xMgxO2 thin films. Oxygen intercalation in CuSc1-xMgxO2+y films improves the conductivity at the expense of optical transparency. We have improved the conductivity of CuGaO2-based films from 0.02 to 1 S/cm, by substitution of Fe for Ga. p-Type conductivity has been demonstrated in an Ag-based delafossite film. A sputter-deposited AgCoO2 film has a conductivity of 0.2 S/cm, a Seebeck coefficient of 230 muV/K and a band gap of 4.1 eV at room temperature. CuNi2/3Sb1/3O2 films have been produced that are p-type conductors when doped with Sn. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:119 / 124
页数:6
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