Plasmonic components fabrication via nanoimprint

被引:83
作者
Boltasseva, Alexandra [1 ,2 ]
机构
[1] Purdue Univ, Birck Nanotechnol Ctr, Sch Elect & Comp Engn, W Lafayette, IN 47907 USA
[2] Tech Univ Denmark, DTU Foton, Dept Photon Engn, Nano DTU, DK-2800 Lyngby, Denmark
来源
JOURNAL OF OPTICS A-PURE AND APPLIED OPTICS | 2009年 / 11卷 / 11期
关键词
plasmonics; surface plasmon-polaritons; nanofabrication; nanolithography; nanoimprint lithography; plasmonic waveguides; ENHANCED RAMAN-SCATTERING; NEGATIVE-INDEX; WAVE-GUIDES; 2ND-HARMONIC GENERATION; EDGE MODES; LITHOGRAPHY; PROPAGATION; TECHNOLOGY; GRATINGS; OPTICS;
D O I
10.1088/1464-4258/11/11/114001
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
A review report on nanoimprinted plasmonic components is given. The fabrication of different metal-dielectric geometries and nanostructured surfaces that support either propagating or localized surface plasmon modes is discussed. The main characteristics and advantages of the nanoimprint technology for the fabrication of various plasmonic structures are outlined. The discussion of plasmonic waveguiding structures focuses on planar waveguides based on metal strips embedded into a dielectric and on profiled metal surfaces. Nanoimprint-based fabrication of two-dimensional nanostructured plasmonic surfaces for enhanced transmission studies and sensor applications is also discussed. Throughout the report, the main fabrication schemes are described, as well as the challenges facing future manufacturing of plasmonic components for device applications.
引用
收藏
页数:11
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