Atomic-precision multilayer coating of the first set of optics for an extreme-ultraviolet lithography prototype system

被引：15

作者：

Montcalm, C

Grabner, RF

Hudyma, RM

Schmidt, MA

Spiller, E

Walton, CC

Wedowski, M

Folta, JA

机构：

[1] Lawrence Livermore Natl Lab, Informat Sci & Technol, Livermore, CA 94551 USA

[2] Paragon Opt, San Ramon, CA 94583 USA

来源：

APPLIED OPTICS | 2002年 / 41卷 / 16期

关键词：

D O I：

10.1364/AO.41.003262

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We present our results of coating a first set of optical elements for an extreme-ultraviolet (EUV) lithography system. The optics were coated with Mo-Si multilayer mirrors by de magnetron sputtering and characterized by synchrotron radiation. Near-normal incidence reflectances above 65% were achieved at 13.35 nm. The run-to-run reproducibility of the reflectance peak wavelength was maintained to within 0.4%, and the thickness uniformity (or gradient) was controlled to within 4-0.05% peak to valley, exceeding the prescribed specification. The deposition technique used for this study is an enabling technology for EUV lithography, making it possible to fabricate multilayer-coated optics to accuracies commensurate with atomic dimensions. (C) 2002 Optical Society of America.

引用

页码：3262 / 3269

页数：8

共 17 条

[1]

Boher P., 1991, P SOC PHOTOOPT INSTR, V1547, P21

[2] First lithographic results from the extreme ultraviolet Engineering Test Stand [J].

Chapman, HN ;

Ray-Chaudhuri, AK ;

Tichenor, DA ;

Replogle, WC ;

Stulen, RH ;

Kubiak, GD ;

Rockett, PD ;

Klebanoff, LE ;

O'Connell, D ;

Leung, AH ;

Jefferson, KL ;

Wronosky, JB ;

Taylor, JS ;

Hale, LC ;

Blaedel, K ;

Spiller, EA ;

Sommargren, GE ;

Folta, JA ;

Sweeney, DW ;

Gullikson, EM ;

Naulleau, P ;

Goldberg, KA ;

Bokor, J ;

Attwood, DT ;

Mickan, U ;

Hanzen, R ;

Panning, E ;

Yan, PY ;

Gwyn, CW ;

Lee, SH .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (06) :2389-2395

[3] Advances in multilayer reflective coatings for extreme-ultraviolet lithography [J].

Folta, JA ;

Bajt, S ;

Barbee, TW ;

Grabner, RF ;

Mirkarimi, PB ;

Nguyen, T ;

Schmidt, MA ;

Spiller, E ;

Walton, CC ;

Wedowski, M ;

Montcalm, C .

EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2, 1999, 3676 :702-709

[4] Sub-100-nm lithographic imaging with an EUV 10x microstepper [J].

Goldsmith, JEM ;

Berger, KW ;

Bozman, DR ;

Cardinale, GF ;

Folk, DR ;

Henderson, CC ;

O'Connell, DJ ;

Ray-Chaudhuri, AK ;

Stewart, KD ;

Tichenor, DA ;

Chapman, HN ;

Gaughan, R ;

Hudyma, RM ;

Montcalm, C ;

Spiller, EA ;

Taylor, JS ;

Williams, JD ;

Goldberg, KA ;

Gullikson, EM ;

Naulleau, P ;

Cobb, JL .

EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2, 1999, 3676 :264-271

[5]

Gutman G, 1994, J Xray Sci Technol, V4, P142, DOI 10.3233/XST-1994-4207

[6] MASKED DEPOSITION TECHNIQUES FOR ACHIEVING MULTILAYER PERIOD VARIATIONS REQUIRED FOR SHORT-WAVELENGTH (68-ANGSTROM) SOFT-X-RAY IMAGING OPTICS [J].

KORTRIGHT, JB ;

GULLIKSON, EM ;

DENHAM, PE .

APPLIED OPTICS, 1993, 32 (34) :6961-6968

[7] Multilayer reflective coatings for extreme-ultraviolet lithography [J].

Montcalm, C ;

Bajt, S ;

Mirkarimi, PB ;

Spiller, E ;

Weber, FJ ;

Folta, JA .

EMERGING LITHOGRAPHIC TECHNOLOGIES II, 1998, 3331 :42-51

[8] Multilayer coating and test of the optics for two new 10X Microstepper extreme-ultraviolet lithography cameras [J].

Montcalm, C ;

Spiller, E ;

Weber, FJ ;

Wedowski, M ;

Folta, JA ;

Gullikson, EM .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (04) :1219-1228

[9] STRUCTURE AND PERFORMANCE OF SI/MO MULTILAYER MIRRORS FOR THE EXTREME-ULTRAVIOLET [J].

SLAUGHTER, JM ;

SCHULZE, DW ;

HILLS, CR ;

MIRONE, A ;

STALIO, R ;

WATTS, RN ;

TARRIO, C ;

LUCATORTO, TB ;

KRUMREY, M ;

MUELLER, P ;

FALCO, CM .

JOURNAL OF APPLIED PHYSICS, 1994, 76 (04) :2144-2156

[10] FABRICATION OF HIGH-REFLECTANCE MO-SI MULTILAYER MIRRORS BY PLANAR-MAGNETRON SPUTTERING [J].

STEARNS, DG ;

ROSEN, RS ;

VERNON, SP .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (05) :2662-2669

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