Current status of nanonex nanoimprint solutions

被引：10

作者：

Tan, H ^{[1
]}

Kong, L ^{[1
]}

Li, MT ^{[1
]}

Steere, C ^{[1
]}

Koecher, L ^{[1
]}

机构：

[1] Nanonex Corp, Monmouth Jct, NJ 08552 USA

来源：

EMERGING LITHOGRAPHIC TECHNOLOGIES VIII | 2004年 / 5374卷

关键词：

lithography; NGL; NIL; T-NIL; P-NIL; air cushion press; nanonex; nanofabrication;

D O I：

10.1117/12.537241

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Nanoimprint lithography (NIL) has the advantage of high-throughput, sub-10 nm resolution and low cost [1]. It has been included into 2003 ITRS as the Next Generation Lithography (NGL) for 45 nm node [2]. This paper summarized current status of Nanonex imprint technologies. Nanonex imprint process includes thermal nanoimprint (T-NIL) and photo-curable nanoimprint (P-NIL). Both T-NIL and P-NIL utilized a proprietary air cushion press (ACP), which has the advantage of ultra-uniformity, low lateral stress, less damage to the mold and substrate, and higher alignment accuracy. Nanonex Corporation delivers user-friendly nanoimprint lithography tools and solutions for both experts and non-experts of micro and nanofabrication. Nanoimprint machines, resists, molds and processes have been developed and are available today.

引用

页码：213 / 221

页数：9

共 5 条

[1] Imprint lithography with 25-nanometer resolution [J].