Improvement in tunability and dielectric loss of (Ba0.5Sr0.5)TiO3 capacitors using seed layers on Pt/Ti/SiO2/Si substrates

被引:20
作者
Jeon, YA [1 ]
Shin, WC [1 ]
Seo, TS [1 ]
Yoon, SG [1 ]
机构
[1] Chungnam Natl Univ, Dept Mat Engn, Taejon 305764, South Korea
关键词
D O I
10.1557/JMR.2002.0411
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The absence of a low dielectric constant layer at the barium strontium titanate (BST)/Pt interface and a decreased roughness are critical issues in the production of (Ba0.5Sr0.5)TiO3 thin films with high tunabilities and low losses. An improvement in dielectric properties was achieved by the insertion of seed layers at the BST/Pt interface by pulsed laser deposition. The higher tunability can be attributed to (100) texturing of the BST films, which is independent of grain size and grain morphologies, thus leading to a variation in seed layer thicknesses. The tunability and dielectric constant of 1600-Angstrom-thick BST films showed a maximum of 53% and 720, respectively, at a seed layer thickness of 100 Angstrom. Dielectric loss is dependent on the roughness of BST films and reached a minimum of 0.8% at a root mean square roughness of 28 A. The maximum figures of merit, defined as the ratio of tunability to dielectric loss, of approximately 58 at 100 kHz and 198 kV/cm were obtained at a seed layer thickness of 70 Angstrom. The optimized seed layer thickness for BST deposition onto Pt/Ti/SiO2/Si substrates plays an important role in maintaining the high tunabilities and low loss, which are suitable for microwave device applications.
引用
收藏
页码:2831 / 2836
页数:6
相关论文
共 19 条
[1]  
ANDA FA, 1998, INTEGR FERROELECTR, V22, P269
[2]   The effect of annealing on the microwave properties of Ba0.5Sr0.5TiO3 thin films [J].
Chang, WT ;
Horwitz, JS ;
Carter, AC ;
Pond, JM ;
Kirchoefer, SW ;
Gilmore, CM ;
Chrisey, DB .
APPLIED PHYSICS LETTERS, 1999, 74 (07) :1033-1035
[3]   HETEROEPITAXIAL GROWTH OF BA1-XSRXTIO3 YBA2CU3O7-X BY PLASMA-ENHANCED METALORGANIC CHEMICAL-VAPOR-DEPOSITION [J].
CHERN, CS ;
LIANG, S ;
SHI, ZQ ;
YOON, S ;
SAFARI, A ;
LU, P ;
KEAR, BH ;
GOODREAU, BH ;
MARKS, TJ ;
HOU, SY .
APPLIED PHYSICS LETTERS, 1994, 64 (23) :3181-3183
[4]   Improvement of dielectric properties of (Ba,Sr)TiO3 thin films deposited by pulse injection chemical vapor deposition [J].
Cho, HJ ;
Kim, HJ .
APPLIED PHYSICS LETTERS, 1998, 72 (07) :786-788
[5]   Improvements of the properties of chemical-vapor-deposited (Ba,Sr)TiO3 films through use of a seed layer [J].
Choi, YC ;
Lee, J ;
Lee, BS .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1997, 36 (11) :6824-6828
[6]   Improvements in tunability of (Ba0.5Sr0.5)TiO3 thin films by use of metalorganic chemical vapor deposited (Ba,Sr)RuO3 interfacial layers [J].
Jeon, YA ;
Choi, ES ;
Seo, TS ;
Yoon, SG .
APPLIED PHYSICS LETTERS, 2001, 79 (07) :1012-1014
[7]   Microwave properties of tetragonally distorted (Ba0.5Sr0.5)TiO3 thin films [J].
Kim, WJ ;
Chang, W ;
Qadri, SB ;
Pond, JM ;
Kirchoefer, SW ;
Chrisey, DB ;
Horwitz, JS .
APPLIED PHYSICS LETTERS, 2000, 76 (09) :1185-1187
[8]   Growth and characterization of Ba0.6Sr0.4TiO3 thin films on Si with Pt electrodes [J].
Kinder, L ;
Zhang, XF ;
Grigorov, IL ;
Kwon, C ;
Jia, QX ;
Luo, L ;
Zhao, J .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1999, 17 (04) :2148-2150
[9]  
KINGON AI, 1995, MRS BULL, V21, P18
[10]   Procedure of microwave investigations of ferroelectric films and tunable microwave devices based on ferroelectric films. [J].
Kozyrev, AB ;
Keis, VN ;
Koepf, G ;
Yandrofski, R ;
Soldatenkov, OI ;
Dudin, KA ;
Dovgan, DP .
MICROELECTRONIC ENGINEERING, 1995, 29 (1-4) :257-260