Sub-micron focusing of hard X-ray beam by elliptically figured mirrors for scanning X-ray microscopy

被引：11

作者：

Mori, Y ^{[1
]}

Yamauchi, K ^{[1
]}

Yamamura, K ^{[1
]}

Mimura, H ^{[1
]}

Sano, Y ^{[1
]}

Saito, A ^{[1
]}

Ueno, K ^{[1
]}

Endo, K ^{[1
]}

Souvorov, A ^{[1
]}

Yabashi, M ^{[1
]}

Tamasaku, K ^{[1
]}

Ishikawa, T ^{[1
]}

机构：

[1] Osaka Univ, Grad Sch Engn, Dept Precis Sci & Technol, Suita, Osaka 5650871, Japan

来源：

X-RAY MIRRORS, CRYSTALS, AND MULTILAYERS II | 2002年 / 4782卷

关键词：

ultraprecision machining; X-ray mirror; plasma CVM (chemical vaporization machining); EEM (elastic emission machining); coherent X-ray; hard X-ray focusing; K-B mirror arrangement;

D O I：

10.1117/12.453754

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Elliptical mirrors for X-ray microfocusing were manufactured using the new fabrication methods of elastic emission machining (EEM) and plasma chemical vaporization machining (CVM). Surface profiles measured with stitching interferometry showed a maximum deviation around the ideal figure of about 5nm in peak-to-valley. The mirror showed nearly diffraction-limited focusing performance, with a 200 nm line width at the. focus: Wave-optical calculation, taking the measured surface profile into consideration, well reproduced the measured focusing properties both at the beam waist and around the beam waist. In addition, two-dimensional focusing unit using K-B mirror arrangement was also developed and evaluated to have about 200x200 nm(2) focusing performance.

引用

页码：58 / 64

页数：7

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