Step bunching of vicinal GaN(0001) surfaces during molecular beam epitaxy

被引:30
作者
Xie, MH
Cheung, SH
Zheng, LX
Ng, YF
Wu, HS
Ohtani, N
Tong, SY
机构
[1] Univ Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China
[2] Nippon Steel Corp Ltd, Adv Technol Res Lab, Sagamihara, Kanagawa 2298551, Japan
来源
PHYSICAL REVIEW B | 2000年 / 61卷 / 15期
关键词
D O I
10.1103/PhysRevB.61.9983
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Step bunching of vicinal GaN(0001) surface during epitaxial growth is observed by scanning tunneling microscopy. Large step stiffness and repulsive step-step interaction are suggested based on step morphology observations. The size of the bunch changes with time, depending on the direction in which the substrate is heated by a direct current. This observation provides evidence for the electromigration effect causing the step bunching, and from the field dependence we infer that adatoms, which are likely N, have effective positive charges.
引用
收藏
页码:9983 / 9985
页数:3
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