Optical second-harmonic phase spectroscopy of the Si(111)-SiO2 interface

被引:8
作者
Aktsipetrov, OA
Dolgova, TV
Fedyanin, AA
Schuhmacher, D
Marowsky, G
机构
[1] Laser Lab Goettingen, D-37077 Gottingen, Germany
[2] Moscow MV Lomonosov State Univ, Dept Phys, Moscow 119899, Russia
基金
俄罗斯基础研究基金会;
关键词
second-harmonic generation; spectroscopy; phase measurements; silicon(111);
D O I
10.1016/S0040-6090(99)00909-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The two-photon interband electron transitions in a silicon layer directly underneath the Si(111)-SiO2 interface in the vicinity of the E-2 critical point (CP) are probed by optical second-harmonic (SH) spectroscopy. The combination of the SH phase and intensity spectroscopy allows the complete deconvolution of the spectral behavior of the amplitude and phase of the quadratic susceptibility chi((2)) near the E-2 critical point of silicon. (C) 2000 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:91 / 94
页数:4
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