Growth model for plasma-CVD growth of carbon nano-tubes on Ni-sheets

被引：30

作者：

Wunderlich, Wilfried ^{[1
]}

机构：

[1] Tokai Univ, Fac Engn, Dept Mat Sci, Hiratsuka, Kanagawa 2591292, Japan

[2] Nagoya Inst Technol, Grad Sch Engn, Nagoya, Aichi 4668555, Japan

来源：

关键词：

plasma-enhanced chemical vapor deposition; carbon nano tribe; microstructure; characterization; chemical reaction;

D O I：

10.1016/j.diamond.2006.07.005

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The plasma enhanced chemical vapor deposition (PECVD) of carbon nano-tubes (CNT) on nickel sheets is considered as efficient production method of great technologically interest. Different morphologies of CNT on Ni-sheets can be achieved by a variation of the process parameters, like partial pressure of the acetylene and ammoniac inlet gas mixture, the total gas pressure, and temperature. The results are summarized in a detailed growth model based on thermodynamic considerations. The conclusion from this model is that the production of single-wall nano-tubes (SWCNT), which is more desirable than multi wall variants (MWCNT) or graphite nano-fibers (GNF), requires the fastest reaction velocity for CNT formation. The PECVD supports the CNT formation, but for enhancement of the reaction velocity additional inhibitors are required. (c) 2006 Elsevier B.V. All rights reserved.

引用

页码：369 / 378

页数：10

共 62 条

[1] Ab initio study of the effect of nitrogen on carbon nanotube growth [J].

Ahn, HS ;

Lee, SC ;

Han, S ;

Lee, KR ;

Kim, DY .

NANOTECHNOLOGY, 2006, 17 (03) :909-912

[2]

AJAYAN PM, 2000, HDB NANOSTRUCTURED M

[3] CATALYTIC GROWTH OF CARBON FILAMENTS [J].

BAKER, RTK .

CARBON, 1989, 27 (03) :315-323

[4] Carbon nanotubes - the route toward applications [J].

Baughman, RH ;

Zakhidov, AA ;

de Heer, WA .

SCIENCE, 2002, 297 (5582) :787-792

[5] Plasma composition during plasma-enhanced chemical vapor deposition of carbon nanotubes [J].

Bell, MS ;

Lacerda, RG ;

Teo, KBK ;

Rupesinghe, NL ;

Amaratunga, GAJ ;

Milne, WI ;

Chhowalla, M .

APPLIED PHYSICS LETTERS, 2004, 85 (07) :1137-1139

[6] Direct current bias effects in RF induction thermal plasma diamond CVD [J].

Berghaus, JO ;

Meunier, JL ;

Gitzhofer, FO .

IEEE TRANSACTIONS ON PLASMA SCIENCE, 2002, 30 (01) :442-449

[7] Large-area synthesis of carbon nanofibres at room temperature [J].

Boskovic, BO ;

Stolojan, V ;

Khan, RUA ;

Haq, S ;

Silva, SRP .

NATURE MATERIALS, 2002, 1 (03) :165-168

[8] Plasma-induced alignment of carbon nanotubes [J].

Bower, C ;

Zhu, W ;

Jin, SH ;

Zhou, O .

APPLIED PHYSICS LETTERS, 2000, 77 (06) :830-832

[9] RF-PLASMA DEPOSITED AMORPHOUS HYDROGENATED HARD CARBON THIN-FILMS - PREPARATION, PROPERTIES, AND APPLICATIONS [J].

BUBENZER, A ;

DISCHLER, B ;

BRANDT, G ;

KOIDL, P .

JOURNAL OF APPLIED PHYSICS, 1983, 54 (08) :4590-4595

[10] Pretreatment of Ni-carboxylates metal-organics for growing carbon nanotubes on silicon substrates [J].

Chen, TH ;

Chang, SC ;

Lin, IN .

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