Ion beam assisted deposition of metal nanoclusters in silica thin films

被引：12

作者：

Schiestel, S ^{[1
]}

Cotell, CM ^{[1
]}

Carosella, CA ^{[1
]}

Grabowski, KS ^{[1
]}

Hubler, GK ^{[1
]}

机构：

[1] UNIV HEIDELBERG,INST PHYS CHEM,D-69120 HEIDELBERG,GERMANY

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1997年 / 127卷

关键词：

D O I：

10.1016/S0168-583X(96)01126-3

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Gold and silver nanoclusters in silica were deposited by coevaporation of gold and silicon or silver and silicon under simultaneous oxygen bombardment. The noble metal concentration, the linear absorption coefficient and the cluster size can be controlled by variation of the process parameters. The position of the absorption peak was shifted from 400 to 700 nm by the choice of the cluster metal and the dielectric matrix.

引用

页码：566 / 569

页数：4

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