Influence of surfactants on atomic diffusion

被引:34
作者
Ferrón, J
Gómez, L
Gallego, JM
Camarero, J
Prieto, JE
Cros, V
de Parga, ALV
de Miguel, JJ
Miranda, R
机构
[1] Univ Autonoma Madrid, Dept Fis Mat Condensada, E-28049 Madrid, Spain
[2] Univ Autonoma Madrid, Inst Ciencia Mat Nicolas Cabrera, E-28049 Madrid, Spain
[3] Univ Nacl Litoral, CONICET, Grp Fis INTEC FIQ, RA-3000 Santa Fe, Argentina
[4] Fac Ciencias Exactas Ingn & Agrimensura, Inst Fis Rosario, RA-2000 Rosario, Santa Fe, Argentina
[5] CSIC, Inst Ciencia Mat, E-28049 Madrid, Spain
关键词
atomistic dynamics; copper; growth; lead; metal-metal interfaces; Monte Carlo simulations; surface diffusion;
D O I
10.1016/S0039-6028(00)00459-3
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We have used Monte Carlo simulations with realistic interatomic potentials, combined with experimental results obtained by He diffraction (thermal energy atom scattering) and STM to investigate the effect of a surfactant agent such as Pb on the mechanisms of atomic diffusion involved in epitaxial metal growth. We find that the main role of the surfactant is to hinder fast diffusion by hopping over the surface, which is the dominant mechanism on a compact face such as Cu(111), and to promote exchange. As a side effect, this facilitates interlayer diffusion and hence layer-by-layer growth, because islands are smaller and have rougher borders; adatoms reaching an edge have more opportunities to cross them by exchange with a step atom. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:135 / 148
页数:14
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