TEM-nanoindentation studies of semiconducting structures

被引:14
作者
Le Bourhis, E.
Patriarche, G.
机构
[1] Univ Politiers, Lab Met Phys, UMR CNRS 6630, F-86962 Futuroscope, France
[2] Lab Photon & Nanostruct, UPR CNRS 20, F-91460 Marcoussis, France
关键词
transmission electron microscopy; nanoindentation; plasticity; phase transition; semiconducting structure;
D O I
10.1016/j.micron.2006.06.007
中图分类号
TH742 [显微镜];
学科分类号
摘要
This paper reviews the application of nanoindentation coupled with transmission electron microscopy (TEM) to investigations of the plastic behaviour of semiconducting structures and its implication for device design. Instrumented nanoindentation has been developed to extract the mechanical behaviour of small volumes scaled to those encountered in semiconductor heterostructures. We illustrate that TEM is a powerful complementary tool for the study of local plasticity induced by nanoindentation. TEM-nanoindentation allows for detailed understanding of the plastic deformation in semiconducting structures and opens practical routes for improvement of devices. Performances of heterostructures are deteriously affected by dislocations that relax the lattice mismatched layers. Different ways to obtain compliant substructures are being developed in order to concentrate the plastic relaxation underneath the heterostructure. Such approaches allow for mechanical design of micro- and optoelectronic devices to be considered throughout the fabrication process. (c) 2006 Elsevier Ltd. All rights reserved.
引用
收藏
页码:377 / 389
页数:13
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