Porous tantala and alumina films from non-thickness limited anodising in phosphate/glycerol electrolyte

被引:28
作者
Lu, Q
Alcalá, G
Skeldon, P
Thompson, GE
Graham, MJ
Masheder, D
Shimizu, K
Habazaki, H
机构
[1] Univ Manchester, Inst Sci & Technol, Ctr Corros & Protect, Manchester M60 1QD, Lancs, England
[2] Natl Res Council Canada, Inst Microstruct Sci, Ottawa, ON K1A 0R6, Canada
[3] AVX Ltd, Tantalum Div, Paignton TQ4 7ER, Devon, England
[4] Keio Univ, Chem Lab, Yokohama, Kanagawa 223, Japan
[5] Hokkaido Univ, Grad Sch Engn, Kita Ku, Sapporo, Hokkaido 0608628, Japan
基金
英国工程与自然科学研究理事会;
关键词
tantalum; aluminium; anodising; porous film;
D O I
10.1016/S0013-4686(02)00545-5
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The present study demonstrates that the phenomenon of non-thickness limited (NTL) growth of anodic films in a phosphate/ glycerol electrolyte at 453 K on tantalum and aluminium is due to the formation of porous films. For both tantala and alumina films, the resultant morphology comprises cells of material orientated approximately normal to the metal/film interface, with each cell containing a central pore of typical diameter in the range 3-15 nm and a barrier layer of film material at the base of the pore. The total porosity is about 5%. The hardness of NTL tantala films, determined by nanoindentation, was 5.1 GPa, reasonably similar to that of conventional anodic tantala. (C) 2002 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:37 / 42
页数:6
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