1/f Noise in doped and undoped amorphous silicon

被引:10
作者
Johanson, RE [1 ]
Günes, M
Kasap, SO
机构
[1] Univ Saskatchewan, Dept Elect Engn, Saskatoon, SK S7N 5A9, Canada
[2] Izmir Inst Technol, Dept Phys, TR-35210 Alsancak, Turkey
关键词
D O I
10.1016/S0022-3093(99)00832-7
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We measured the spectrum of conductance fluctuations in n-type, p-type, and undoped hydrogenated amorphous silicon (a-Si:H) as a function of temperature. In general, the spectra can be fit to a power law, 1/f(alpha), although in the p-type and undoped samples deviations from a strict power law occur. For n-type and p-type samples, the noise magnitude increases with temperature by approximately a factor of 5 from 295 to 450 K. The slope parameter, alpha, also increases with temperature in the p-type samples from near unity to 1.4 but not in the n-type sample where it remains near 1.05 independent of temperature. The undoped sample could be measured only over a limited range of elevated temperatures, but alpha does trend larger. The undoped and lightly doped material have similar noise levels but larger p-type doping reduces the noise by two orders of magnitude. Correlation measurements indicate the 1/f noise is Gaussian for all samples. However, intermittent random-telegraph noise is observed in n-type material. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:242 / 246
页数:5
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