Correlation between composition, microstructure, and ferroelectric properties of SrBi2Ta2O9 thin films

被引:15
作者
Ono, S
Sakakibara, A
Seki, T
Osaka, T
Koiwa, I
Mita, J
Iwabuchi, T
Asami, K
机构
[1] WASEDA UNIV,DEPT APPL CHEM,SCH SCI & ENGN,KAGAMI MEM LAB MAT SCI & TECHNOL,SHINJUKU KU,TOKYO 169,JAPAN
[2] OKI ELECT IND CO LTD,MICROSYST TECHNOL LAB,HACHIOJI,TOKYO 193,JAPAN
[3] TOHOKU UNIV,INST MAT RES,AOBA KU,SENDAI,MIYAGI 98077,JAPAN
关键词
D O I
10.1149/1.1837793
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
SrBi2Ta2O9 thin films prepared by a solution-deposition process were formed at various annealing temperatures. P-E hysteresis loops of the films exhibited well-defined shapes, and the leakage current decreased with increasing annealing temperature except for one annealed at 750 degrees C. The considerable amount of metallic Bi on the film surface diffused from the inner part was evaluated by a quantitative x-ray photoelectron spectroscopic analysis. A discontinuity in morphology such as cavities detected by transmission electron microscopic observation at grain boundaries between large single-crystal grains and microcrystallite regions, which was pronounced in the film annealed at 750 degrees C, is suggested as inducing an increase in leakage current by the condensation of metallic Bi at the cavities.
引用
收藏
页码:L185 / L187
页数:3
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