A filtered are evaporation system was used in the deposition of microdroplet-free TiN films. It was created within a conventional bell jar vacuum system using a magnetic-field steered are and a plasma duct formed from a free standing and isolated high current solenoid. The films were reactively deposited onto glass substrates by are evaporation of titanium in a nitrogen/argon atmosphere. The TiN films examined by scanning electron microscopy, showed a fine structure, with a small grain size of 20-30 nm. The optical properties for thin films showed good selectivity in their spectral reflectance. X-ray diffraction showed a strong alignment of the [111] direction parallel to the film surface. (C) 1997 Elsevier Science S.A.