ION-BEAM-DEPOSITED FILMS PRODUCED BY FILTERED ARC EVAPORATION

被引:69
作者
MARTIN, PJ
NETTERFIELD, RP
KINDER, TJ
机构
[1] CSIRO Division of Applied Physics, Sydney
关键词
D O I
10.1016/S0040-6090(05)80014-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A filtered arc evaporation source has been used to deposit films of carbon, aluminium, Al2O3, AlN, vanadium, VN, VO2, titanium, TiN, copper, zirconium, ZrO2, ZrN and steel. The films are of high optical quality and free of macroparticles. The microhardness of the deposited films has been measured and found to range from 1040 HV 5 for ZrO2 to 3600 HV 5 for carbon. The optical properties of deposited ZrO2 and Al2O3 have been measured and found to be equivalent to the values reported for evaporated and ion-plated films. The deposition rates have been estimated at 40-mu-m h-1 for titanium and 35-mu-m h-1 for Al2O3. The process is found to be a practical high rate deposition technique suitable for the deposition of a wide range of technologically important materials.
引用
收藏
页码:77 / 83
页数:7
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