MICROSTRUCTURE ANALYSIS OF THIN-FILMS DEPOSITED BY REACTIVE EVAPORATION AND BY REACTIVE ION PLATING

被引：41

作者：

GUENTHER, KH

LOO, B

BURNS, D

EDGELL, J

WINDHAM, D

MULLER, KH

机构：

[1] UNIV ALABAMA,HUNTSVILLE,AL 35899

[2] CSIRO,DIV APPL PHYS,SYDNEY,NSW 2070,AUSTRALIA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期

关键词：

D O I：

10.1116/1.576299

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1436 / 1445

页数：10

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