High optical transparency and good adhesion of diamond films deposited on fused silica windows with a surface-wave sustained plasma

被引：10

作者：

Airoldi, VT

Borges, CFM

Moisan, M

Guay, D

机构：

[1] UNIV MONTREAL, GRP PHYS PLASMAS, MONTREAL, PQ H3C 3J7, CANADA

[2] UNIV QUEBEC, INST NATL RECH SCI ENERGIE & MAT, VARENNES, PQ J3X 1S2, CANADA

来源：

APPLIED OPTICS | 1997年 / 36卷 / 19期

关键词：

diamond; optical coating; microwave plasma chemical vapor deposition; surface-wave plasma;

D O I：

10.1364/AO.36.004400

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We utilized a microwave plasma reactor based on a surface-wave-sustained discharge for uniform coating of fused silica windows with polycrystalline diamond films. Grain size and average roughness as small as 30 and 2.2 nm, respectively, were obtained, resulting in a uniform loss of transparency of only 10% over the 190-800-nm band for as-deposited 1.5-mu m-thick coatings. A pretreatment procedure provides a film coating with a surface resistance to scratching that is approximately a factor of 2 higher than that of bare fused silica. (C) 1997 Optical Society of America.

引用

页码：4400 / 4402

页数：3