Local degradation of magnetic properties in magnetic thin films irradiated by Ga+ focused-ion-beams

被引：16

作者：

Park, CM ^{[1
]}

Bain, JA ^{[1
]}

机构：

[1] Carnegie Mellon Univ, Ctr Data Storage Syst, Dept Elect & Comp Engn, Pittsburgh, PA 15213 USA

来源：

IEEE TRANSACTIONS ON MAGNETICS | 2002年 / 38卷 / 05期

关键词：

FeCoN; FIB irradiation; Ga implantation; Kerr microscopy; magnetic properties; NiFe;

D O I：

10.1109/TMAG.2002.802681

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The magnetic properties of NiFe and FeCoN thin films were examined using Kerr microscopy after Ga+ focused-ion-beam (FIB) irradiation. Magneto-optic characterizations of 30 mum x 30 mum irradiated surface areas showed that the magnetization was reduced in approximately linear proportion to the Ga+ ion dose. Above an ion dose of approximately 0.6 nC/mum(2) (3.8 x 10(17) ions/cm(2)), little sign of the Kerr rotation could be found. The effect of the irradiation on the coercive force was also examined. Little effect of the beam on the coercivity of NiFe was seen, but an increase of coercivity was seen in FeCoN. The reduction of the Kerr rotation is attributed to magnetic moment loss caused by Ga implantation into the magnetic thin films. This loss has been quantified and is relevant to pole trimming for high-density magnetic recording heads.

引用

页码：2237 / 2239

页数：3

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