The mechanical properties of alumina films formed by plasma deposition and by ion irradiation of sapphire

被引：27

作者：

Barbour, JC ^{[1
]}

Knapp, JA ^{[1
]}

Follstaedt, DM ^{[1
]}

Mayer, TM ^{[1
]}

Minor, KG ^{[1
]}

Linam, DL ^{[1
]}

机构：

[1] Sandia Natl Labs, Albuquerque, NM 87123 USA

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2000年 / 166卷

关键词：

alumina; nanoindentation; irradiation; plasma-deposited; yield strength;

D O I：

10.1016/S0168-583X(99)00648-5

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 [仪器科学与技术]; 080401 [精密仪器及机械]; 081102 [检测技术与自动化装置];

摘要：

This paper examines the correlation between mechanical properties and the density, phase and hydrogen content of deposited alumina layers, and compares them to those of sapphire and amorphous alumina synthesized through ion-beam irradiation of sapphire. Alumina films were deposited using electron beam evaporation of aluminum and cobombardment with O-2(+) ions (30-230 eV) from an electron-cyclotron resonance (ECR) plasma. The II content and phase were controlled by varying the deposition temperature and the ion energy. Sapphire was amorphized at 84 K by irradiation with Al and O ions (in stoichiometric ratio) to a defect level of 4 dpa in order to form an amorphous layer 370 nm thick. Nanoindentation was performed to determine the elastic modulus, yield strength and hardness of all materials. Sapphire and amorphized sapphire have a higher density and exhibit superior mechanical properties in comparison to the deposited alumina films. Density was determined to be the primary factor affecting the mechanical properties, which showed only a weak correlation to the hydrogen content. (C) 2000 Published by Elsevier Science B.V. All rights reserved.

引用

页码：140 / 147

页数：8

共 18 条

[1]

Stress, hydration, and optical absorption in ion-implanted aluminum oxide [J].