Formation of periodic steps with a unit-cell height on 6H-SiC (0001) surface by HCl etching

被引:98
作者
Nakamura, S [1 ]
Kimoto, T
Matsunami, H
Tanaka, S
Teraguchi, N
Suzuki, A
机构
[1] Kyoto Univ, Dept Elect Sci & Engn, Sakyo Ku, Kyoto 6068501, Japan
[2] Hokkaido Univ, Res Inst Elect Sci, Kita Ku, Sapporo, Hokkaido 0600812, Japan
[3] Sharp Corp, Adv Technol Res Labs, Nara 6328567, Japan
关键词
D O I
10.1063/1.126663
中图分类号
O59 [应用物理学];
学科分类号
摘要
Step bunching on 6H-SiC (0001)-vicinal face etched by HCl at 1390-1500 degrees C is investigated by atomic force microscopy. When the substrate has the inclination toward near [01 (1) over bar 0] or even [11 (2) over tilde 0], continuous parallel and periodic microsteps with six-bilayer height are laid perpendicular to the off direction, although those perpendicular to [11 (2) over bar 0] are apt to decompose into three bilayer or less. Formation mechanism of unit-cell-height steps is discussed based on consideration of bond configuration at step edges. (C) 2000 American Institute of Physics. [S0003-6951(00)01623-5].
引用
收藏
页码:3412 / 3414
页数:3
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