Fabrication of photonic crystal structures on light emitting diodes by nanoimprint lithography

被引：112

作者：

Kim, Sang Hoon

Lee, Ki-Dong

Kim, Ja-Yeon

Kwon, Min-Ki

Park, Seong-Ju

机构：

[1] LG Elect, Devices & Mat Lab, Inst Technol, Seoul 137724, South Korea

[2] GIST, Dept Mat Sci & Engn, Kwangju 500712, South Korea

[3] GIST, Natl Res Lab Nanophoton Semicond, Kwangju 500712, South Korea

来源：

NANOTECHNOLOGY | 2007年 / 18卷 / 05期

关键词：

D O I：

10.1088/0957-4484/18/5/055306

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Photonic crystal ( PC) structures on green light emitting diodes ( LED) were successfully fabricated using nanoimprint lithography. The stamp, with a two-dimensional pillar structure, was fabricated using laser interference lithography through a double exposure technique. To achieve PC structures with a precise dimension, thermal treatment of the photoresist was employed during stamp fabrication; this proved to be effective for the control of the diameter and shape of the hole. The two-dimensional PC structures, with a period of 295 nm, diameter of 180 nm and depth of 100 nm, on the green LEDs resulted in nine-fold enhancement of the photoluminescence intensity compared to the as-deposited samples without PC structures.

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页数：5

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