Structural and optical characterization of ZnO nanocrystalline films deposited by sputtering

被引：136

作者：

Chawla, Amit Kumar

Kaur, Davinder

Chandra, Ramesh ^{[1
]}

机构：

[1] Indian Inst Technol, Inst Instrumentat Ctr, Roorkee 247667, Uttar Pradesh, India

[2] Indian Inst Technol, Dept Phys, Roorkee 247667, Uttar Pradesh, India

来源：

OPTICAL MATERIALS | 2007年 / 29卷 / 08期

关键词：

ZnO thin films; dc magnetron sputtering; XRD; SEM;

D O I：

10.1016/j.optmat.2006.02.020

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Nanocrystalline ZnO thin films were prepared by do magnetron sputtering in an Ar + O-2 gas mixture using two types of targets; one was commercially available zinc metal (purity 99.99%) and the other was pressed Zn metal powder. Influences of the target conditions as well as the oxygen partial pressure on the structural and optical properties were studied. Microstructure of the films was investigated using X-ray diffraction and scanning electron microscopy the optical properties were examined using UV Visible spectrophotometer. The films deposited from metal target showed better aligned c-axis orientation and exhibited better optical properties compared to films prepared from pressed metal powder target. (c) 2006 Elsevier B.V. All rights reserved.

引用

页码：995 / 998

页数：4

共 27 条

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