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175% tunnel magnetoresistance at room temperature and high thermal stability using Co2FeAl0.5Si0.5 full-Heusler alloy electrodes
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作者:

Tezuka, N.
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机构: Tohoku Univ, Grad Sch Engn, Dept Mat Sci, Sendai, Miyagi 9808579, Japan

Ikeda, N.
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机构: Tohoku Univ, Grad Sch Engn, Dept Mat Sci, Sendai, Miyagi 9808579, Japan

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Inomata, K.
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机构: Tohoku Univ, Grad Sch Engn, Dept Mat Sci, Sendai, Miyagi 9808579, Japan
机构:
[1] Tohoku Univ, Grad Sch Engn, Dept Mat Sci, Sendai, Miyagi 9808579, Japan
[2] JST, CREST, Saitama 3320012, Japan
[3] Natl Inst Mat Sci, Tsukuba, Ibaraki 3050047, Japan
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D O I:
10.1063/1.2420793
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O59 [应用物理学];
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摘要:
The authors have fabricated epitaxially grown spin-valve-type magnetic tunnel junctions with L2(1)-Co2FeAl0.5Si0.5 full-Heusler alloys for top and bottom electrodes and a MgO barrier. For MgO thickness t(MgO)=1.5 nm, tunnel magnetoresistance (TMR) ratio and resistance and area product (RA) initially increase up to around 350 degrees C and then decrease by annealing, while for t(MgO)=2.0 and 2.5 nm, the TMR ratio increases with annealing temperature and peaks around 500 degrees C. The TMR ratio up to 175% at RT and thermal stability up to 500 degrees C have been achieved for t(MgO)=2.0 nm, suggesting the large tunneling spin polarization and high thermal stability for Co2FeAl0.5Si0.5 with L2(1) structure. (c) 2006 American Institute of Physics.
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[1]
Properties of the quaternary half-metal-type Heusler alloy Co2Mn1-xFexSi
[J].
Balke, Benjamin
;
Fecher, Gerhard H.
;
Kandpal, Hem C.
;
Felser, Claudia
;
Kobayashi, Keisuke
;
Ikenaga, Eiji
;
Kim, Jung-Jin
;
Ueda, Shigenori
.
PHYSICAL REVIEW B,
2006, 74 (10)

论文数: 引用数:
h-index:
机构:

Fecher, Gerhard H.
论文数: 0 引用数: 0
h-index: 0
机构: Johannes Gutenberg Univ Mainz, Inst Anorgan & Analyt Chem, D-55099 Mainz, Germany

Kandpal, Hem C.
论文数: 0 引用数: 0
h-index: 0
机构: Johannes Gutenberg Univ Mainz, Inst Anorgan & Analyt Chem, D-55099 Mainz, Germany

Felser, Claudia
论文数: 0 引用数: 0
h-index: 0
机构: Johannes Gutenberg Univ Mainz, Inst Anorgan & Analyt Chem, D-55099 Mainz, Germany

Kobayashi, Keisuke
论文数: 0 引用数: 0
h-index: 0
机构: Johannes Gutenberg Univ Mainz, Inst Anorgan & Analyt Chem, D-55099 Mainz, Germany

Ikenaga, Eiji
论文数: 0 引用数: 0
h-index: 0
机构: Johannes Gutenberg Univ Mainz, Inst Anorgan & Analyt Chem, D-55099 Mainz, Germany

Kim, Jung-Jin
论文数: 0 引用数: 0
h-index: 0
机构: Johannes Gutenberg Univ Mainz, Inst Anorgan & Analyt Chem, D-55099 Mainz, Germany

Ueda, Shigenori
论文数: 0 引用数: 0
h-index: 0
机构: Johannes Gutenberg Univ Mainz, Inst Anorgan & Analyt Chem, D-55099 Mainz, Germany
[2]
230% room-temperature magnetoresistance in CoFeB/MgO/CoFeB magnetic tunnel junctions
[J].
Djayaprawira, DD
;
Tsunekawa, K
;
Nagai, M
;
Maehara, H
;
Yamagata, S
;
Watanabe, N
;
Yuasa, S
;
Suzuki, Y
;
Ando, K
.
APPLIED PHYSICS LETTERS,
2005, 86 (09)
:1-3

Djayaprawira, DD
论文数: 0 引用数: 0
h-index: 0
机构: Anelva Corp, Electron Device Equipment Div, Fuchu, Tokyo 1838508, Japan

Tsunekawa, K
论文数: 0 引用数: 0
h-index: 0
机构: Anelva Corp, Electron Device Equipment Div, Fuchu, Tokyo 1838508, Japan

Nagai, M
论文数: 0 引用数: 0
h-index: 0
机构: Anelva Corp, Electron Device Equipment Div, Fuchu, Tokyo 1838508, Japan

Maehara, H
论文数: 0 引用数: 0
h-index: 0
机构: Anelva Corp, Electron Device Equipment Div, Fuchu, Tokyo 1838508, Japan

Yamagata, S
论文数: 0 引用数: 0
h-index: 0
机构: Anelva Corp, Electron Device Equipment Div, Fuchu, Tokyo 1838508, Japan

Watanabe, N
论文数: 0 引用数: 0
h-index: 0
机构: Anelva Corp, Electron Device Equipment Div, Fuchu, Tokyo 1838508, Japan

Yuasa, S
论文数: 0 引用数: 0
h-index: 0
机构: Anelva Corp, Electron Device Equipment Div, Fuchu, Tokyo 1838508, Japan

Suzuki, Y
论文数: 0 引用数: 0
h-index: 0
机构: Anelva Corp, Electron Device Equipment Div, Fuchu, Tokyo 1838508, Japan

Ando, K
论文数: 0 引用数: 0
h-index: 0
机构: Anelva Corp, Electron Device Equipment Div, Fuchu, Tokyo 1838508, Japan
[3]
Tunnel magnetoresistance in MgO-barrier magnetic tunnel junctions with bcc-CoFe(B) and fcc-CoFe free layers
[J].
Ikeda, S.
;
Hayakawa, J.
;
Lee, Y. M.
;
Tanikawa, T.
;
Matsukura, F.
;
Ohno, H.
.
JOURNAL OF APPLIED PHYSICS,
2006, 99 (08)

Ikeda, S.
论文数: 0 引用数: 0
h-index: 0
机构: Tohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, Japan

Hayakawa, J.
论文数: 0 引用数: 0
h-index: 0
机构: Tohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, Japan

Lee, Y. M.
论文数: 0 引用数: 0
h-index: 0
机构: Tohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, Japan

Tanikawa, T.
论文数: 0 引用数: 0
h-index: 0
机构: Tohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, Japan

Matsukura, F.
论文数: 0 引用数: 0
h-index: 0
机构: Tohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, Japan

Ohno, H.
论文数: 0 引用数: 0
h-index: 0
机构: Tohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, Japan
[4]
TUNNELING BETWEEN FERROMAGNETIC-FILMS
[J].
JULLIERE, M
.
PHYSICS LETTERS A,
1975, 54 (03)
:225-226

JULLIERE, M
论文数: 0 引用数: 0
h-index: 0
机构:
INST NATL SCI APPL,35031 RENNES,FRANCE INST NATL SCI APPL,35031 RENNES,FRANCE
[5]
High tunnel magnetoresistance in fully epitaxial magnetic tunnel junctions with a full-Heusler alloy Co2Cr0.6Fe0.4Al thin film
[J].
Marukame, Takao
;
Ishikawa, Takayuki
;
Matsuda, Ken-Ichi
;
Uemura, Tetsuya
;
Yamamoto, Masafumi
.
APPLIED PHYSICS LETTERS,
2006, 88 (26)

Marukame, Takao
论文数: 0 引用数: 0
h-index: 0
机构:
Hokkaido Univ, Grad Sch Informat Sci & Technol, Div Elect Informat, Kita Ku, Sapporo, Hokkaido 0600814, Japan Hokkaido Univ, Grad Sch Informat Sci & Technol, Div Elect Informat, Kita Ku, Sapporo, Hokkaido 0600814, Japan

Ishikawa, Takayuki
论文数: 0 引用数: 0
h-index: 0
机构:
Hokkaido Univ, Grad Sch Informat Sci & Technol, Div Elect Informat, Kita Ku, Sapporo, Hokkaido 0600814, Japan Hokkaido Univ, Grad Sch Informat Sci & Technol, Div Elect Informat, Kita Ku, Sapporo, Hokkaido 0600814, Japan

Matsuda, Ken-Ichi
论文数: 0 引用数: 0
h-index: 0
机构:
Hokkaido Univ, Grad Sch Informat Sci & Technol, Div Elect Informat, Kita Ku, Sapporo, Hokkaido 0600814, Japan Hokkaido Univ, Grad Sch Informat Sci & Technol, Div Elect Informat, Kita Ku, Sapporo, Hokkaido 0600814, Japan

Uemura, Tetsuya
论文数: 0 引用数: 0
h-index: 0
机构:
Hokkaido Univ, Grad Sch Informat Sci & Technol, Div Elect Informat, Kita Ku, Sapporo, Hokkaido 0600814, Japan Hokkaido Univ, Grad Sch Informat Sci & Technol, Div Elect Informat, Kita Ku, Sapporo, Hokkaido 0600814, Japan

Yamamoto, Masafumi
论文数: 0 引用数: 0
h-index: 0
机构:
Hokkaido Univ, Grad Sch Informat Sci & Technol, Div Elect Informat, Kita Ku, Sapporo, Hokkaido 0600814, Japan Hokkaido Univ, Grad Sch Informat Sci & Technol, Div Elect Informat, Kita Ku, Sapporo, Hokkaido 0600814, Japan
[6]
Atomic disorder effects on half-metallicity of the full-Heusler alloys Co2(Cr1-xFex)Al:: A first-principles study -: art. no. 144413
[J].
Miura, Y
;
Nagao, K
;
Shirai, M
.
PHYSICAL REVIEW B,
2004, 69 (14)
:144413-1

Miura, Y
论文数: 0 引用数: 0
h-index: 0
机构:
Tohoku Univ, Elect Commun Res Inst, Aoba Ku, Sendai, Miyagi 9808577, Japan Tohoku Univ, Elect Commun Res Inst, Aoba Ku, Sendai, Miyagi 9808577, Japan

Nagao, K
论文数: 0 引用数: 0
h-index: 0
机构:
Tohoku Univ, Elect Commun Res Inst, Aoba Ku, Sendai, Miyagi 9808577, Japan Tohoku Univ, Elect Commun Res Inst, Aoba Ku, Sendai, Miyagi 9808577, Japan

Shirai, M
论文数: 0 引用数: 0
h-index: 0
机构:
Tohoku Univ, Elect Commun Res Inst, Aoba Ku, Sendai, Miyagi 9808577, Japan Tohoku Univ, Elect Commun Res Inst, Aoba Ku, Sendai, Miyagi 9808577, Japan
[7]
GIANT MAGNETIC TUNNELING EFFECT IN FE/AL2O3/FE JUNCTION
[J].
MIYAZAKI, T
;
TEZUKA, N
.
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS,
1995, 139 (03)
:L231-L234

MIYAZAKI, T
论文数: 0 引用数: 0
h-index: 0

TEZUKA, N
论文数: 0 引用数: 0
h-index: 0
[8]
LARGE MAGNETORESISTANCE AT ROOM-TEMPERATURE IN FERROMAGNETIC THIN-FILM TUNNEL-JUNCTIONS
[J].
MOODERA, JS
;
KINDER, LR
;
WONG, TM
;
MESERVEY, R
.
PHYSICAL REVIEW LETTERS,
1995, 74 (16)
:3273-3276

MOODERA, JS
论文数: 0 引用数: 0
h-index: 0
机构: Francis Bitter National Magnet Laboratory, Massachusetts Institute of Technology, Cambridge

KINDER, LR
论文数: 0 引用数: 0
h-index: 0
机构: Francis Bitter National Magnet Laboratory, Massachusetts Institute of Technology, Cambridge

WONG, TM
论文数: 0 引用数: 0
h-index: 0
机构: Francis Bitter National Magnet Laboratory, Massachusetts Institute of Technology, Cambridge

MESERVEY, R
论文数: 0 引用数: 0
h-index: 0
机构: Francis Bitter National Magnet Laboratory, Massachusetts Institute of Technology, Cambridge
[9]
Giant tunnelling magnetoresistance at room temperature with MgO (100) tunnel barriers
[J].
Parkin, SSP
;
Kaiser, C
;
Panchula, A
;
Rice, PM
;
Hughes, B
;
Samant, M
;
Yang, SH
.
NATURE MATERIALS,
2004, 3 (12)
:862-867

Parkin, SSP
论文数: 0 引用数: 0
h-index: 0
机构:
IBM Corp, Almaden Res Ctr, Div Res, IBM Infineon MRAM Dev Alliance, San Jose, CA 95120 USA IBM Corp, Almaden Res Ctr, Div Res, IBM Infineon MRAM Dev Alliance, San Jose, CA 95120 USA

Kaiser, C
论文数: 0 引用数: 0
h-index: 0
机构:
IBM Corp, Almaden Res Ctr, Div Res, IBM Infineon MRAM Dev Alliance, San Jose, CA 95120 USA IBM Corp, Almaden Res Ctr, Div Res, IBM Infineon MRAM Dev Alliance, San Jose, CA 95120 USA

Panchula, A
论文数: 0 引用数: 0
h-index: 0
机构:
IBM Corp, Almaden Res Ctr, Div Res, IBM Infineon MRAM Dev Alliance, San Jose, CA 95120 USA IBM Corp, Almaden Res Ctr, Div Res, IBM Infineon MRAM Dev Alliance, San Jose, CA 95120 USA

Rice, PM
论文数: 0 引用数: 0
h-index: 0
机构:
IBM Corp, Almaden Res Ctr, Div Res, IBM Infineon MRAM Dev Alliance, San Jose, CA 95120 USA IBM Corp, Almaden Res Ctr, Div Res, IBM Infineon MRAM Dev Alliance, San Jose, CA 95120 USA

Hughes, B
论文数: 0 引用数: 0
h-index: 0
机构:
IBM Corp, Almaden Res Ctr, Div Res, IBM Infineon MRAM Dev Alliance, San Jose, CA 95120 USA IBM Corp, Almaden Res Ctr, Div Res, IBM Infineon MRAM Dev Alliance, San Jose, CA 95120 USA

Samant, M
论文数: 0 引用数: 0
h-index: 0
机构:
IBM Corp, Almaden Res Ctr, Div Res, IBM Infineon MRAM Dev Alliance, San Jose, CA 95120 USA IBM Corp, Almaden Res Ctr, Div Res, IBM Infineon MRAM Dev Alliance, San Jose, CA 95120 USA

Yang, SH
论文数: 0 引用数: 0
h-index: 0
机构:
IBM Corp, Almaden Res Ctr, Div Res, IBM Infineon MRAM Dev Alliance, San Jose, CA 95120 USA IBM Corp, Almaden Res Ctr, Div Res, IBM Infineon MRAM Dev Alliance, San Jose, CA 95120 USA
[10]
Magnetic tunnel junctions using B2-ordered Co2MnAl Heusler alloy epitaxial electrode
[J].
Sakuraba, Y
;
Nakata, J
;
Oogane, M
;
Ando, Y
;
Kato, H
;
Sakuma, A
;
Miyazaki, T
;
Kubota, H
.
APPLIED PHYSICS LETTERS,
2006, 88 (02)
:1-3

Sakuraba, Y
论文数: 0 引用数: 0
h-index: 0
机构:
Tohoku Univ, Grad Sch Engn, Dept Appl Phys, Aoba Ku, Aobayama 6-6-05, Sendai, Miyagi 980, Japan Tohoku Univ, Grad Sch Engn, Dept Appl Phys, Aoba Ku, Aobayama 6-6-05, Sendai, Miyagi 980, Japan

Nakata, J
论文数: 0 引用数: 0
h-index: 0
机构: Tohoku Univ, Grad Sch Engn, Dept Appl Phys, Aoba Ku, Aobayama 6-6-05, Sendai, Miyagi 980, Japan

Oogane, M
论文数: 0 引用数: 0
h-index: 0
机构: Tohoku Univ, Grad Sch Engn, Dept Appl Phys, Aoba Ku, Aobayama 6-6-05, Sendai, Miyagi 980, Japan

Ando, Y
论文数: 0 引用数: 0
h-index: 0
机构: Tohoku Univ, Grad Sch Engn, Dept Appl Phys, Aoba Ku, Aobayama 6-6-05, Sendai, Miyagi 980, Japan

Kato, H
论文数: 0 引用数: 0
h-index: 0
机构: Tohoku Univ, Grad Sch Engn, Dept Appl Phys, Aoba Ku, Aobayama 6-6-05, Sendai, Miyagi 980, Japan

Sakuma, A
论文数: 0 引用数: 0
h-index: 0
机构: Tohoku Univ, Grad Sch Engn, Dept Appl Phys, Aoba Ku, Aobayama 6-6-05, Sendai, Miyagi 980, Japan

Miyazaki, T
论文数: 0 引用数: 0
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