Dislocated epitaxial islands

被引:30
作者
Liu, XH [1 ]
Ross, FM [1 ]
Schwarz, KW [1 ]
机构
[1] IBM Corp, Thomas J Watson Res Ctr, Yorktown Heights, NY 10598 USA
关键词
D O I
10.1103/PhysRevLett.85.4088
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Dislocation networks observed in CoSi2 islands grown epitaxially on Si are compared with the results of dislocation-dynamics calculations. The calculations make use of the fact that image forces play a relatively minor role compared to line tension forces and dislocation-dislocation interactions. Remarkable agreement is achieved, demonstrating that this approach can be applied more generally to study dislocations in other mesostructures.
引用
收藏
页码:4088 / 4091
页数:4
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