Desorption/ionization on silicon (DIOS) mass spectrometry: background and applications

被引:150
作者
Lewis, WG
Shen, ZX
Finn, MG
Siuzdak, G
机构
[1] Scripps Res Inst, Ctr Mass Spectrometry, Dept Chem, La Jolla, CA 92037 USA
[2] Scripps Res Inst, Ctr Mass Spectrometry, Dept Mol Biol, La Jolla, CA 92037 USA
[3] Mass Consortium Corp, San Diego, CA 92122 USA
关键词
desorption/ionization on silicon (DIOS); silicon; matrix-less; high-throughput;
D O I
10.1016/S1387-3806(02)00973-9
中图分类号
O64 [物理化学(理论化学)、化学物理学]; O56 [分子物理学、原子物理学];
学科分类号
070203 ; 070304 ; 081704 ; 1406 ;
摘要
Desorption/ionization on silicon mass spectrometry (DIOS-MS) is a matrix-less laser vaporization method for generating gas-phase ions. The physical properties of the silicon surfaces are crucial to DIOS-MS performance and are controlled by the selection of silicon type and the silicon etching conditions. DIOS-MS has been examined for its applicability to small-molecule analysis, quantitative studies, reaction monitoring, chromatography, protein identification, and protein functional characterization. In organic chemistry, DIOS has been applied to the analysis of reactions directed toward development of new catalysts and transformations. Because DIOS offers a chip-based format, it is capable of being used to raster the silicon surface for biological and chemical screening applications, such as enzymatic activity assays. DIOS-MS extends the mass analysis capabilities of laser desorption to small biomolecules and thus offers a platform on which multiple experiments can be performed on a wide variety of molecules. (C) 2002 Elsevier Science B.V. All rights reserved.
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页码:107 / 116
页数:10
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