Comparative analysis of nanostructured diblock copolymer films

被引:49
作者
Müller-Buschbaum, P
Hermsdorf, N
Roth, SV
Wiedersich, J
Cunis, S
Gehrke, R
机构
[1] TU Munchn, Phys Dept E13, D-85748 Garching, Germany
[2] Inst Polymerforsch Dresden eV, D-01069 Dresden, Germany
[3] European Synchrotron Radiat Facil, F-38043 Grenoble, France
[4] Tech Univ Munich, LS Phys Weihenstephan, D-85350 Freising Weihenstephan, Germany
[5] DESY, HASYLAB, D-22603 Hamburg, Germany
关键词
dewetting; GISAXS; polymer films;
D O I
10.1016/j.sab.2004.07.019
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
Nanostructured polymer films of poly(styrene-block-paramethylstyrene) diblock copolymers P(Sd-b-pMS) on silicon substrates with a native oxide layer are investigated. Resulting from a storage under toluene vapor, a surface structure is installed. The early stages, characterized by the creation of a host structure out of an initially continuous film, are addressed. Grazing incidence small-angle X-ray scattering (GISAXS) experiments were performed as a function of exposure time. Results are compared to modelling of the scattering pattern and other experimental techniques, such as grazing incidence small-angle neutron scattering (GISANS) and atomic force microscopy (AFM) data. Possibilities and limits of the techniques are discussed. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:1789 / 1797
页数:9
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