Comparative analysis of nanostructured diblock copolymer films

被引：49

作者：

Müller-Buschbaum, P

Hermsdorf, N

Roth, SV

Wiedersich, J

Cunis, S

Gehrke, R

机构：

[1] TU Munchn, Phys Dept E13, D-85748 Garching, Germany

[2] Inst Polymerforsch Dresden eV, D-01069 Dresden, Germany

[3] European Synchrotron Radiat Facil, F-38043 Grenoble, France

[4] Tech Univ Munich, LS Phys Weihenstephan, D-85350 Freising Weihenstephan, Germany

[5] DESY, HASYLAB, D-22603 Hamburg, Germany

来源：

SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY | 2004年 / 59卷 / 10-11期

关键词：

dewetting; GISAXS; polymer films;

D O I：

10.1016/j.sab.2004.07.019

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

Nanostructured polymer films of poly(styrene-block-paramethylstyrene) diblock copolymers P(Sd-b-pMS) on silicon substrates with a native oxide layer are investigated. Resulting from a storage under toluene vapor, a surface structure is installed. The early stages, characterized by the creation of a host structure out of an initially continuous film, are addressed. Grazing incidence small-angle X-ray scattering (GISAXS) experiments were performed as a function of exposure time. Results are compared to modelling of the scattering pattern and other experimental techniques, such as grazing incidence small-angle neutron scattering (GISANS) and atomic force microscopy (AFM) data. Possibilities and limits of the techniques are discussed. (C) 2004 Elsevier B.V. All rights reserved.

引用

收藏

页码：1789 / 1797

页数：9

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