Morphology of dual beam ion sputtered films investigated by atomic force microscopy

被引：17

作者：

Lee, CC ^{[1
]}

Hsu, JC ^{[1
]}

Wei, DT ^{[1
]}

Lin, JH ^{[1
]}

机构：

[1] Natl Cent Univ, Inst Opt Sci, Chungli 32054, Taiwan

来源：

THIN SOLID FILMS | 1997年 / 308卷

关键词：

dual ion-beam sputtering; surface morphology; surface roughness; deposition rate;

D O I：

10.1016/S0040-6090(97)00544-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The quality of dual beam ion sputtered films for optical application has been investigated using atomic force microscopy (AFM). The improvement of the surface morphology due to the second ion beam is discussed in detail. The influence on the optical properties and the deposition rates of the mixing of oxygen with the working gas in the second ion sources is also discussed. (C) 1997 Elsevier Science S.A.

引用

页码：74 / 78

页数：5

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