Plasma enhanced deposition of titanium aluminium composite films using organometallic aluminium precursors

被引：7

作者：

Taschner, C ^{[1
]}

Klosowski, J ^{[1
]}

Leonhardt, A ^{[1
]}

Dumichen, U ^{[1
]}

机构：

[1] Inst Festkorper & Werkstofforsch Dresden, D-01171 Dresden, Germany

来源：

SURFACE & COATINGS TECHNOLOGY | 1998年 / 98卷 / 1-3期

关键词：

plasma; titanium aluminium; thin films;

D O I：

10.1016/S0257-8972(97)00313-7

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Thin films of aluminium composites with or without additional titanium have been deposited by plasma enhanced CVD (pulsed d.c. discharge) at a deposition temperature of 770 K (500 degrees C) using various organometallic aluminium starting compounds. The composition and the structure of the layers are determined by gas phase composition and plasma power density. Results concerning microhardness, adherence and coating structure are reported. AlN, AlON, and (Ti,Al)(O,N) coatings could be successfully prepared under the described conditions, but we have failed in depositing crystalline aluminium oxide layers. (C) 1998 Elsevier Science S.A.

引用

页码：925 / 933

页数：9

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