Silica-coating of AgI semiconductor nanoparticles

被引：42

作者：

Kobayashi, Y

Misawa, K

Takeda, M

Kobayashi, M

Satake, M

Kawazoe, Y

Ohuchi, N

Kasuya, A

Konno, M

机构：

[1] Tohoku Univ, Grad Sch Engn, Dept Chem Engn, Aoba Ku, Sendai, Miyagi 9808579, Japan

[2] Tohoku Univ, Grad Sch Med, Div Surg Oncol, Aoba Ku, Sendai, Miyagi 9808574, Japan

[3] Tohoku Inst Technol, Dept Elect, Taihaku Ku, Sendai, Miyagi 9828577, Japan

[4] Tohoku Univ, Inst Dev Aging & Canc, Aoba Ku, Sendai, Miyagi 9808575, Japan

[5] Tohoku Univ, Inst Mat Res, Aoba Ku, Sendai, Miyagi 9808577, Japan

[6] Tohoku Univ, Interdisciplinary Res Ctr, Aoba Ku, Sendai, Miyagi 9808578, Japan

来源：

COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS | 2004年 / 251卷 / 1-3期

关键词：

Agl; nanoparticle; core-shell; silica coating; sol-gel; Stober method;

D O I：

10.1016/j.colsurfa.2004.10.007

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A method for silica-coating of AgI nanoparticles is proposed, which applies Stober method in the presence of a silane coupling agent, 3-mercaptopropyltrimethoxysilane (MPS), with the use of dimethylamine (DMA) catalyst for alkoxide hydrolysis. The AgI nanoparticles were prepared from AgClO(4) and KI. The silica-coating was performed with 0-2.3 x 10(-5) M MPS, 11-20 M water, 0-0. 1 M DMA and 0.0004-0.15 M tetraethyl orthosilicate (TEOS). The addition of MPS suppressed generation of free silica particles and improved uniformity of shell thickness. Silica shells were formed at water concentrations of 11-15 M, but excess water (20M) caused aggregation of free silica particles, and resulted in formation of gel network. The silica shell thickness could be varied from 3 to 33.0 nm as the TEOS concentration was increased from 0.0004 to 0.04 M at 4.5 x 10(-6) M MPS under the condition of 11 M water and 0.01 M DMA. (C) 2004 Elsevier BX All rights reserved.

引用

页码：197 / 201

页数：5

共 18 条

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