Reflective polarizer based on a stacked double-layer subwavelength metal grating structure fabricated using nanoimprint lithography

被引：127

作者：

Yu, ZN ^{[1
]}

Deshpande, P ^{[1
]}

Wu, W ^{[1
]}

Wang, J ^{[1
]}

Chou, SY ^{[1
]}

机构：

[1] Princeton Univ, Dept Elect Engn, Nanostruct Lab, Princeton, NJ 08544 USA

来源：

APPLIED PHYSICS LETTERS | 2000年 / 77卷 / 07期

关键词：

D O I：

10.1063/1.1288674

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A reflective polarizer consisting of two layers of 190 nm period metal gratings was fabricated using nanoimprint lithography. Measurements with a He-Ne laser (wavelength=632.8 nm) showed that at normal incidence, this polarizer reflects light polarized perpendicular to the grating lines (transverse magnetic polarization) with a reflectance of 54%, but strongly absorbs parallel-polarized light (transverse electric polarization) with a reflectance of only 0.25%. The enhanced polarization extinction ratio of over 200 at this wavelength is possibly related to the resonance between the two layers of metal gratings. This polarizer is thin, compact, and is suited for integrated optical systems. (C) 2000 American Institute of Physics. [S0003-6951(00)01133-5].

引用

页码：927 / 929

页数：3

共 11 条

[1] OPTICAL-PROPERTIES OF VERY THIN METAL-FILMS FOR LAMINATED POLARIZERS
BABA, K
SHIRAISHI, K
OBI, K
KATAOKA, T
KAWAKAMI, S
[J]. APPLIED OPTICS, 1988, 27 (12): : 2554 - 2560
[2] Polarizing mirror/absorber for visible wavelengths based on a silicon subwavelength grating: design and fabrication
Brundrett, DL
Gaylord, TK
Glytsis, EN
[J]. APPLIED OPTICS, 1998, 37 (13): : 2534 - 2541
[3] Polarimetry of thin metal transmission gratings in the resonance region and its impact on the response of metal-semiconductor-metal photodetectors
Chen, E
Chou, SY
[J]. APPLIED PHYSICS LETTERS, 1997, 70 (20) : 2673 - 2675
[4] Nanoimprint lithography
Chou, SY
Krauss, PR
Renstrom, PJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06): : 4129 - 4133
[5] Birefringent thin-film polarizers for use at normal incidence and with planar technologies
Hodgkinson, I
Wu, QH
[J]. APPLIED PHYSICS LETTERS, 1999, 74 (13) : 1794 - 1796
[6] Polarization-sensitive subwavelength antireflection surfaces on a semiconductor for 975 nm
Smith, RE
Warren, ME
Wendt, JR
Vawter, GA
[J]. OPTICS LETTERS, 1996, 21 (15) : 1201 - 1203
[7] Al wire-grid polarizer using the s-polarization resonance effect at the 0.8-mu m-wavelength band
Tamada, H
Doumuki, T
Yamaguchi, T
Matsumoto, S
[J]. OPTICS LETTERS, 1997, 22 (06) : 419 - 421
[8] Design, fabrication, and characterization of farm-birefringent multilayer polarizing beam splitter
Tyan, RC
Salvekar, AA
Chou, HP
Cheng, CC
Scherer, A
Sun, PC
Xu, F
Fainman, Y
[J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION, 1997, 14 (07): : 1627 - 1636
[9] Large area high density quantized magnetic disks fabricated using nanoimprint lithography
Wu, W
Cui, B
Sun, XY
Zhang, W
Zhuang, L
Kong, LS
Chou, SY
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06): : 3825 - 3829
[10] ELECTROMAGNETIC PROPAGATION IN PERIODIC STRATIFIED MEDIA .2. BIREFRINGENCE, PHASE MATCHING, AND X-RAY LASERS
YARIV, A
YEH, P
[J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1977, 67 (04) : 438 - 448

← 1 2 →