Polarimetry of thin metal transmission gratings in the resonance region and its impact on the response of metal-semiconductor-metal photodetectors

被引:11
作者
Chen, E
Chou, SY
机构
[1] Department of Electrical Engineering, Nanostructure Laboratory, University of Minnesota, Minneapolis
关键词
Computer simulation - Electron beam lithography - Fused silica - Light polarization - Light transmission - Opacity - Photodetectors - Polarimeters - Resonance;
D O I
10.1063/1.118990
中图分类号
O59 [应用物理学];
学科分类号
摘要
The resonance behavior of metal transmission gratings and its impact on the response of metal-semiconductor-metal (MSM) photodetectors have been studied experimentally and theoretically. The metal gratings, with finger spacings in the subwavelength region of the visible light, were fabricated using e-beam lithography and lift-off. Strong resonances have been observed only in the S polarization. As a result, the light transmitted through a grating is primarily S polarized if the grating's finger spacing is less than one-third of the wavelength of the incident light, but P polarized otherwise. Similar phenomenon has been observed in the response of MSM photodetectors since the fingers (electrodes) of an MSM photodetector basically form a grating. Theoretical simulations employing the rigorous modal-expansion theory fairly predict the observed phenomenon. (C) 1997 American Institute of Physics.
引用
收藏
页码:2673 / 2675
页数:3
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