NANOSCALE METAL-SEMICONDUCTOR METAL PHOTODETECTORS WITH SUBPICOSECOND RESPONSE-TIME FABRICATED USING ELECTRON-BEAM LITHOGRAPHY

被引:11
作者
LIU, MY [1 ]
CHOU, SY [1 ]
HSIANG, TY [1 ]
ALEXANDROU, S [1 ]
SOBOLEWSKI, R [1 ]
机构
[1] UNIV ROCHESTER,DEPT ELECT ENGN,ROCHESTER,NY 14627
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1992年 / 10卷 / 06期
关键词
D O I
10.1116/1.586338
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Metal-semiconductor-metal photodetectors (MSM PDs) with finger spacing and width as small as 25 nm have been fabricated using high-resolution electron beam lithography. Measurements using an electro-optic sampling system show that the fastest detector has a full width at half-maximum response time of 0.87 ps and a 3 dB bandwidth of 510 GHz. Monte Carlo simulation of detector response time is studied and compared with experimental data. Finally, scaling rules for high-speed MSM PDs are proposed.
引用
收藏
页码:2932 / 2935
页数:4
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