Substrate morphology and particle adhesion in reacting systems

被引:65
作者
Cooper, K
Gupta, A
Beaudoin, S
机构
[1] Arizona State Univ, Dept Chem Bio & Mat Engn, Tempe, AZ 85287 USA
[2] Speedfam IPEC Corp, Chandler, AZ 85226 USA
关键词
particle adhesion; van der Waals interactions; surface morphology; atomic force microscopy; polystyrene spheres;
D O I
10.1006/jcis.2000.6881
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
This paper describes an effort to measure and model changes in the adhesion of micron-scale particles to substrates in systems in which chemical reactions are occurring. Contact interactions between polystyrene latex spheres and silicon substrates (with surface oxide) immersed in aqueous KNO3 solutions were studied. Two important results were obtained. First, it was shown that the AFM can be employed to monitor, in situ, changes in adhesive interactions induced by surface chemical reactions in this system. Second, the morphology of the interacting surfaces plays a controlling role in particle adhesion. In particular, for this system, changes in roughness of the substrate changed the interaction force by nearly 90%. (C) 2000 Academic Press.
引用
收藏
页码:213 / 219
页数:7
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